| Display title | Exposure latitude |
| Default sort key | Exposure latitude |
| Page length (in bytes) | 4,730 |
| Namespace ID | 0 |
| Page ID | 241514 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
| HandWiki item ID | None |
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
| Page creator | imported>Pchauhan2001 |
| Date of page creation | 22:25, 6 February 2024 |
| Latest editor | imported>Pchauhan2001 |
| Date of latest edit | 22:25, 6 February 2024 |
| Total number of edits | 1 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
Description | Content |
Article description: (description)
This attribute controls the content of the description and og:description elements. | Exposure latitude is the extent to which a light-sensitive material can be exposed (overexposed or underexposed) and still achieve an acceptable result. This measure is used for digital and analogue processes, e.g. optical microlithography or photography. |
