| Display title | Chemistry:Hafnium(IV) silicate |
| Default sort key | Hafnium(IV) silicate |
| Page length (in bytes) | 2,937 |
| Namespace ID | 3022 |
| Namespace | Chemistry |
| Page ID | 817980 |
| Page content language | en - English |
| Page content model | wikitext |
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| Page creator | imported>TextAI2 |
| Date of page creation | 22:08, 23 October 2022 |
| Latest editor | imported>TextAI2 |
| Date of latest edit | 22:08, 23 October 2022 |
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Description | Content |
Article description: (description)
This attribute controls the content of the description and og:description elements. | Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO4.
Thin films of hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in modern semiconductor... |
